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06/05/2012 |
SII NanoTech Launches the "ActiveFlow" System, an Option for ICP-OES.
Cut Ar-gas Consumption by Half! World's Highest Level Low Consumption of Ar- gas. |
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Measurement and analysis instrument manufacturer SII NanoTechnology Inc. (SIINT), a 100% subsidiary of Seiko Instruments Inc. (SII), releases today "ActiveFlow" system, an option for ICP-OES/ ICP-AES*1, SPS3500 series which achieves world's smallest Argon gas consumption.
ICP-OES measures the impurity in liquid samples in the order from ppm (parts per million) to ppb (parts per billion) order. This instrument is used for a variety of applications such as metal, ceramics, petrochemicals, medicine, agriculture, and environment. Since SII NanoTechnology Inc. released Japan's first computer-controlled sequential type ICP-OES "JY-38PII" in 1980, we kept the top share in the market by releasing innovative products.
Argon gas*2 is used during ICP-OES analysis and this Ar is the source of plasma*3. The standard consumption is around 16 litter per minute. Special torch for "ActiveFlow" system is newly designed by fluid dynamics diagnosis of gas flow. As a result gas consumption decreases by eight litters per minute without compromising measurement accuracy and sensitivity. Thus the running cost of Argon gas can be decreased by about one million yen per year*4 and is very environmentally friendly.
ActiveFlow system can generate stable plasma even with small amount of Argon gas consumed, enabling the analysis of high salt concentration samples.*5
[Main Features of "ActiveFlow" system]
(1) Reduction of Argon gas consumption minimize the Cost of Ownership
Improvement of torch shape and RF generator control decreases plasma gas consumption by eight litters per minute which can cut the purchase cost of Argon gas by half.
(2) Available for high salt sample analysis
Decrease the gas flow rate causes unstable plasma by conventional instruments; however as "ActiveFlow" system can generate stable plasma, and high salt concentration samples can be analyzed.
(3) Compatible torch dimensions
The torch for ActiveFlow system has the same external dimensions with a standard Fassel torch. Additionally the new torch mounting mechanism provides easy and rapid exchange from standard system.
[Note]
*1 ICP-OES: Inductively Coupled Plasma - Optical Emission Spectrometer, ICP-AES: Inductively Coupled Plasma - Atomic Emission Spectrometer are synonymous terms.
*2 Argon is an odorless, colorless monatomic gas at room temperature. It constitutes 0.93 percent of the atmosphere and is the third-most common gas.
*3 Plasma is similar to a gas which is energized and highly ionized to the protons and electrons. ICP-OES utilizes hot plasma of 7,000 to 10,000C which is formed from Argon gas applied high frequency current.
*4 Assume the instrument is used 8hours per day and 20 days per month and 8000yen for 7m3 Argon gas.
*5 It may be required to change this option and standard torch system depending on sample matrix concentration.
Corporate Communication Dept.
Seiko Instruments Inc.
Online Inquiry Form
International Sales & Marketing
Analytical Sales Division
SII NanoTechnology Inc.
Tel: +81-3-6280-0066
Online Inquiry Form
The content of this news release is based on the information as of the release date.Please note that the content may not be always up-to-date.
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